This inventor holds 4 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 2001-2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2007
Title: Innovations of Yoshihiro Ishida in Semiconductor Manufacturing
Introduction
Yoshihiro Ishida is a prominent inventor based in Hitachinaka, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative polishing apparatus and methods. With a total of 4 patents to his name, Ishida's work has had a substantial impact on the efficiency and effectiveness of semiconductor production.
Latest Patents
One of Ishida's latest patents focuses on a polishing apparatus and method for producing semiconductors. This invention addresses the challenges associated with the dressing of a grindstone surface. By utilizing sizing processing, the dressing of the tool surface can be performed while preventing cracks that typically lead to scratches on the grindstone surface. The invention ensures that the flatness of the dressing tool's surface is maintained, even when using thick grindstones. This capability allows for consistent processing with minimal unevenness, thereby extending the life of the dressing tool. Additionally, the sizing-dressing process is conducted in conjunction with wafer processing, which enhances the throughput of the apparatus and maintains a high processing rate. This innovative apparatus and method are particularly effective for planarizing various substrate surfaces that exhibit irregularities.
Career Highlights
Yoshihiro Ishida is associated with Hitachi, Ltd., a leading company in technology and manufacturing. His work at Hitachi has allowed him to develop and refine his inventions, contributing to advancements in semiconductor technology.
Collaborations
Ishida has collaborated with notable colleagues, including Shigeo Moriyama and Katsuhiko Yamaguchi. Their combined expertise has fostered a collaborative environment that promotes innovation and the development of cutting-edge technologies.
Conclusion
Yoshihiro Ishida's contributions to semiconductor manufacturing through his innovative polishing apparatus and methods highlight his role as a key inventor in the field. His work not only improves the efficiency of semiconductor production but also sets a standard for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile