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Years Active: 2008
Title: Innovations by Yoshihiro Ii in Phase Shift Mask Technology
Introduction
Yoshihiro Ii, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative work on phase shift masks. His unique approach and methodology have garnered considerable attention in the industry, showcasing his expertise in advanced materials and photolithography.
Latest Patents
Yoshihiro Ii holds a notable patent for a phase shift mask blank, phase shift mask, and pattern transfer method. The invention entails a phase shift mask blank comprising a phase shift multilayer film on a substrate. The multilayer film includes at least one layer of a light absorption function film and at least one layer of a phase shift function film. Notably, the light absorption film features an extinction coefficient that increases as the wavelength transitions from 157 nm to 260 nm and maintains a thickness of up to 15 nm. This innovative mask blank minimizes the wavelength dependency of transmittance and facilitates processing with a single dry etching gas, representing a remarkable advancement in photolithographic technologies.
Career Highlights
Over his career, Yoshihiro Ii has been associated with prominent companies such as Shin-Etsu Chemical Co., Ltd. and Toppan Printing Co., Ltd. His extensive experience in these leading organizations has enabled him to refine his skills and contribute to various technological advancements within the semiconductor industry.
Collaborations
Throughout his career, Yoshihiro Ii has collaborated with several talented individuals, including Hiroki Yoshikawa and Yukio Inazuki. These collaborative efforts have further enriched his innovative approach and have led to the successful development of advanced materials and technologies in the field.
Conclusion
Yoshihiro Ii stands out as a key figure in the world of semiconductor innovation, particularly through his groundbreaking work on phase shift masks. With one significant patent to his name and a robust professional background, he continues to influence advancements in photolithography, contributing to the future of semiconductor manufacturing. His work not only demonstrates his inventiveness but also highlights the collaborative spirit of innovation in the industry.