Yokohama, Japan

Yoshihiro Aoki

This inventor holds 1 USPTO granted patent. Top assignee: Lasertec Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihiro Aoki. Retrieved from https://idiyas.com/inventor/yoshihiro-aoki-89xbgor1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Yoshihiro Aoki

Introduction

Yoshihiro Aoki is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of optical systems, particularly through his innovative patent that addresses the calculation of shear amounts in interference optical systems.

Latest Patents

Aoki holds a patent for a "Calculation method, image-capturing method, and image-capturing apparatus." This invention provides a method to easily calculate the shear amount produced by an optical element arranged on the optical path of an interference optical system. The calculation method involves capturing an interference contrast image of a quadric surface included in an object surface, measuring the fringe interval of interference fringes in the image, and calculating the shear amount based on a constant in a formula expressing the quadric surface and the fringe interval. He has 1 patent to his name.

Career Highlights

Yoshihiro Aoki is currently employed at Lasertec GmbH, where he continues to develop and refine his innovative ideas in optical technology. His work has been instrumental in advancing the capabilities of image-capturing systems.

Collaborations

Aoki collaborates with Shota Fujiki, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Yoshihiro Aoki's contributions to optical systems through his patent demonstrate his expertise and commitment to innovation. His work continues to influence the field and inspire future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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