Kanagawa, Japan

Yoshihiko Fujimura

This inventor holds 29 USPTO granted patents and 1 published patent application, primarily in Ink Jet Technology. Top assignee: Fuji Xerox Co., Ltd.. Active years: 1987-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihiko Fujimura. Retrieved from https://idiyas.com/inventor/yoshihiko-fujimura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 96.6

Average Co-Inventor Count = 4.1

ph-index = 15

Forward Citations = 571(Granted Patents)


Location History:

  • Kanagawa, JP (1987 - 1999)
  • Ebina, JP (1998 - 2003)
  • Fujisawa, JP (2005 - 2006)

Company Filing History:


Years Active: 1987-2006

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Areas of Expertise:
Optical Sensor Compensation
Compact Array Architecture
Thermal Ink-Jet Head
Ink Supply Device
Ink Jet Printer
Recording Apparatus
Thermal Transfer Media
Electrostatic Ink Jet
29 patents (USPTO):Explore Patents

Title: Yoshihiko Fujimura: Pioneering Inventor from Kanagawa

Introduction: Yoshihiko Fujimura is a renowned inventor hailing from Kanagawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Fujimura's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable technology for healthcare monitoring, and sustainable energy solutions.

Career Highlights: With a career spanning over two decades, Fujimura has worked with leading tech companies in Japan, spearheading research and development projects that have resulted in numerous successful patents.

Collaborations: Throughout his career, Fujimura has collaborated with top researchers and engineers in the industry, fostering a culture of innovation and pushing the boundaries of what is possible in the tech world.

Conclusion: Yoshihiko Fujimura's dedication to innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and engineers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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