The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2003
Filed:
May. 06, 1996
Naoki Morita, Ebina, JP;
Jun Isozaki, Ebina, JP;
Toshinobu Hamazaki, Ebina, JP;
Masahiko Fujii, Ebina, JP;
Yoshihiko Fujimura, Ebina, JP;
Yukihisa Koizumi, Ebina, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
A channel wafer has a plurality of nozzle flow channels and a common ink reservoir. Pits communicating with the ink reservoir from above heating elements are formed in a polyimide layer on a heater wafer. Each of the pits has a throttled portion in the rear of the heating element and the terminal of a nozzle flow channel is situated on the throttled portion so as to form the minimum sectional area portion of the flow channel. Stable ink discharge characteristics are attained by means of the flow channel resistance of the minimum sectional area portion and bubble pressure is prevented from being relieved toward the ink reservoir. The pressure propagated to the ink reservoir is made to attenuate internally, so that no crosstalk is produced.