Tokyo, Japan

Yoshiharu Chinone

This inventor holds 1 USPTO granted patent. Top assignee: Mitsui Engineering and Shipbuilding Company Limited. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshiharu Chinone. Retrieved from https://idiyas.com/inventor/yoshiharu-chinone

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: **Yoshiharu Chinone: Innovating the Production of α-SiC Wafers**

Introduction

Yoshiharu Chinone, an esteemed inventor based in Tokyo, Japan, has made significant strides in the field of semiconductor manufacturing. With a focus on enhancing production techniques, Chinone holds a patent that aims to revolutionize the creation of α-SiC wafers, vital components in various electronic devices.

Latest Patents

Chinone's notable patent, titled "Production method of α-SiC wafer," addresses the need for a stable, reproducible, and cost-effective production process. The invention eliminates the dependency on expensive seed crystal substrates, often scarce in availability. By positioning a β-SiC substrate and SiC raw material in close proximity within crucibles – which are then layered and placed in a radiation tube – this method utilizes induction heating to uniformly heat the materials. As a result, the SiC raw material sublimates and recrystallizes onto the β-SiC substrate, optimizing the manufacturing process.

Career Highlights

Currently associated with Mitsui Engineering and Shipbuilding Company Limited, Chinone has established himself as a prominent figure within the engineering domain. His innovative approaches to wafer production not only enhance operational efficiency but also contribute to reducing material costs, thereby fostering advancements in the semiconductor industry.

Collaborations

Throughout his career, Chinone has worked alongside talented peers, including Shigehiro Nishino and Kazutoshi Murata. These collaborations underscore the importance of teamwork in driving innovation and progress within the field of semiconductor research and manufacturing.

Conclusion

Yoshiharu Chinone exemplifies the spirit of invention through his contributions to α-SiC wafer production. His innovative patent reflects a deep understanding of materials science and engineering, ultimately paving the way for future advancements in semiconductor technology. As industry demands evolve, inventors like Chinone will continue to play a crucial role in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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