Tokyo, Japan

Yoshifumi Takata


Average Co-Inventor Count = 2.0

ph-index = 7

Forward Citations = 170(Granted Patents)


Location History:

  • Hyogo-ken, JP (1996 - 1998)
  • Hyogo, JP (1990 - 2002)
  • Tokyo, JP (2001 - 2014)

Company Filing History:


Years Active: 1990-2014

Loading Chart...
16 patents (USPTO):Explore Patents

Title: Innovations by Yoshifumi Takata in Semiconductor Technology

Introduction

Yoshifumi Takata is a prominent inventor based in Tokyo, Japan, known for his significant contributions to semiconductor technology. With a total of 16 patents to his name, Takata has developed innovative methods that enhance the reliability and performance of semiconductor devices.

Latest Patents

Among his latest patents, Takata has introduced a method of manufacturing semiconductor devices that feature surface protective films on bond pads. This technique aims to suppress the transformation of titanium nitride films into titanium oxide films, even when water permeates the openings over the pads. By improving the reliability of semiconductor devices, his inventions address critical challenges in the industry. Additionally, he has developed a semiconductor device that incorporates surface protective films on bond pads, further enhancing device reliability by preventing cracks in the protective films.

Career Highlights

Throughout his career, Yoshifumi Takata has worked with notable companies such as Mitsubishi Electric Corporation and Renesas Technology Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to groundbreaking innovations.

Collaborations

Takata has collaborated with esteemed colleagues, including Shigeru Harada and Junko Izumitani, to advance research and development in the field of semiconductors.

Conclusion

Yoshifumi Takata's work in semiconductor technology exemplifies the impact of innovative thinking on device reliability and performance. His patents continue to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…