This inventor holds 2 USPTO granted patents. Top assignees: Shibaura Mechatronics Corporation, Sony Dadc Corporation. Active years: 2002-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kanagawa, JP (2002)
- Kanagawa-ken, JP (2014)
Company Filing History:

Years Active: 2002-2014
Title: Innovations of Yoshifumi Oda
Introduction
Yoshifumi Oda is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of technology, particularly in the area of sputtering apparatus and vacuum mechanisms. With a total of 2 patents to his name, Oda's work reflects a commitment to advancing engineering solutions.
Latest Patents
Oda's latest patents include a magnetron sputtering apparatus and a magnetron sputtering method. The magnetron sputtering apparatus features a sputtering chamber designed for film formation, equipped with a gas introduction port and a rotatable magnet. This innovative design allows for precise control of the sputtering process based on the circumferential position of the magnet and gas pressure distribution. His second patent, a vacuum apparatus with a compact drive mechanism, eliminates the need for special vacuum seals. This mechanism utilizes an air bag container and a high-pressure gas source to facilitate movement within a vacuum vessel.
Career Highlights
Throughout his career, Yoshifumi Oda has worked with prominent companies such as Shibaura Mechatronics Corporation and Sony DADC Corporation. His experience in these organizations has contributed to his expertise in developing advanced technological solutions.
Collaborations
Oda has collaborated with notable colleagues, including Takehiro Sato and Jiro Ikeda. These partnerships have likely fostered innovation and creativity in his projects.
Conclusion
Yoshifumi Oda's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in sputtering and vacuum technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile