Company Filing History:
Years Active: 2016
Title: Yoshiaki Yoshida: Innovator in Substrate Processing Technology
Introduction
Yoshiaki Yoshida is a prominent inventor based in Susono, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique method that enhances the efficiency and stability of plasma generation in substrate processing apparatuses.
Latest Patents
Yoshida holds a patent for a "Method for operating substrate processing apparatus." This method provides a solution for controlling the generation of particles by generating plasma in a stable manner. The process begins with the disposal of a substrate in an evacuated vacuum chamber, followed by the initial supply of a rare gas. A voltage is then applied to a plasma generating means, resulting in the generation of plasma from the rare gas. Afterward, a reaction gas is introduced into the vacuum chamber, where it interacts with the plasma of the rare gas, leading to the generation of plasma from the reaction gas. This innovative method ensures that plasma is stably generated, thereby suppressing particle generation during the substrate processing.
Career Highlights
Yoshiaki Yoshida is associated with Ulvac, Inc., a company known for its advanced technologies in vacuum and substrate processing. His work has been instrumental in enhancing the capabilities of substrate processing apparatuses, making them more efficient and reliable.
Collaborations
Yoshida has collaborated with notable colleagues, including Yutaka Kokaze and Masahisa Ueda. Their combined expertise has contributed to the advancement of substrate processing technologies.
Conclusion
Yoshiaki Yoshida's innovative methods in substrate processing have paved the way for improved technologies in the field. His contributions continue to influence the industry, showcasing the importance of innovation in advancing technology.