Yoshiaki Tanase

Title: Yoshiaki Tanase: Innovator in Plasma Sputter Technology

Introduction

Yoshiaki Tanase is a prominent inventor based in San Jose, California, known for his significant contributions to the field of plasma sputter technology. With a total of nine patents to his name, Tanase has made remarkable advancements that enhance the efficiency and effectiveness of sputter reactors.

Latest Patents

Among his latest innovations is a patent for "Target cooling through gun drilled holes." This invention pertains to a sputter target assembly that is particularly useful for large panel plasma sputter reactors. The target assembly is designed to be sealed to both the main processing chamber and a vacuum pumped chamber housing a moving magnetron. It features an integral plate with parallel cooling holes drilled parallel to the principal faces, ensuring optimal cooling. The ends of these holes are sealed, and vertically extending slots are arranged in staggered groups on each side, machined down to respective pairs of cooling holes on opposite sides of the backing plate. Additionally, four manifold tubes are sealed to the four groups of slots, providing counter-flowing coolant paths.

Another notable patent is for "Methods and apparatus for sealing a chamber." This invention involves a load lock chamber that includes a body with at least one sealing surface wall. The sealing surface wall has an opening for substrate input or output. The body also features a plurality of side walls and a top that includes openings dividing it into two portions. The load lock chamber is equipped with top sealing members that absorb movement between the two portions of the top, ensuring a secure seal.

Career Highlights

Yoshiaki Tanase has built a successful career at Applied Materials, Inc., where he continues to innovate and develop cutting-edge technologies. His work has significantly impacted the semiconductor manufacturing industry, particularly in enhancing the performance of sputter reactors.

Collaborations

Throughout his career, Tanase has collaborated with notable colleagues, including Shinichi Kurita and Akihiro Hosokawa. These collaborations have fostered a creative environment that has led to numerous advancements in their field.

Conclusion

Yoshiaki Tanase's contributions to plasma sputter technology through his innovative patents and collaborative efforts have established him as a key figure in the industry. His work continues to influence the development of advanced manufacturing processes.