Company Filing History:
Years Active: 1982-1989
Title: Yoshiaki Ohwada: Innovator in Semiconductor Technology
Introduction
Yoshiaki Ohwada is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods that enhance the manufacturing and quality assessment of semiconductor elements.
Latest Patents
One of Ohwada's latest patents is a method for predicting the density of micro crystal defects in semiconductors. This innovative approach involves forming an infrared absorption spectrum associated with a silicon wafer used in semiconductor manufacturing. The spectrum features a first oxygen absorption peak in the wavenumber range of 1150 to 1050 cm-1 and a second peak at 530 to 500 cm-1. By reading first and second coefficients that indicate oxygen concentrations at these peaks, the density of micro crystal defects can be predicted using the ratio of these coefficients as a monitor. Another notable patent is a method of manufacturing a semiconductor substrate that includes a modified layer. This process involves mirror-polishing one surface of each of two semiconductor plates, forming a modified layer on at least one polished surface, and bonding the surfaces in a clean atmosphere.
Career Highlights
Throughout his career, Yoshiaki Ohwada has worked with leading companies in the technology sector, including Toshiba Corporation and Sony Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Ohwada has collaborated with notable professionals in his field, including Masaru Shimbo and Kiyoshi Fukuda. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.
Conclusion
Yoshiaki Ohwada's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to impact the industry and pave the way for future advancements in semiconductor manufacturing.