This inventor holds 31 USPTO granted patents and 1 EPO patent, primarily in EUV Lithography. Top assignees: Asahi Glass Company, Limited, Sematech, Inc., Agc Inc.. Active years: 2002-2021.
Location History:
- Kanagawa, JP (2002 - 2008)
- Guilderland, NY (US) (2007 - 2011)
- Schenectady, NY (US) (2009 - 2012)
- Yokohama, JP (2002 - 2013)
- Tokyo, JP (2012 - 2016)
- Chiyoda-ku, JP (2011 - 2021)
Company Filing History:
27 out of 2,560 
2 out of 97 
1 out of 1,142 
Years Active: 2002-2021
Areas of Expertise:
Title: Yoshiaki Ikuta: Innovator in EUV Lithography
Introduction: Yoshiaki Ikuta, a renowned inventor based in Yokohama, Japan, holds an impressive portfolio of 31 patents. His contributions to the field of Extreme Ultraviolet (EUV) lithography have been instrumental in advancing technology in semiconductor manufacturing.
Latest Patents: Among Ikuta's latest inventions is a reflective mask blank specifically designed for EUV lithography. This patented technology aims to improve the flatness of the mask, which is essential for maintaining overlay accuracy during pattern transfer. The reflective mask blank features a unique structure, consisting of a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light. Notably, a conductive film is formed on the rear surface of the substrate, enhancing its functionality. Ikuta's process for inspecting the reflective mask blank distinguishes between phase defects and amplitude defects, ensuring a high standard of quality in manufacturing.
Career Highlights: Throughout his career, Yoshiaki Ikuta has worked for notable companies, including Asahi Glass Company, Limited and Sematech, Inc. His expertise in EUV lithography has been recognized globally, leading to numerous patents that reflect his innovative spirit and commitment to pushing the boundaries of technology.
Collaborations: Ikuta has collaborated with esteemed colleagues, such as Shinya Kikugawa and Akio Masui, contributing to the development of advanced technologies in the field. Their combined efforts have accelerated progress and brought about significant improvements in semiconductor manufacturing processes.
Conclusion: Yoshiaki Ikuta's work in the area of EUV lithography represents a significant advancement in the industry. His inventive approach and practical solutions to complex challenges have solidified his status as a leading inventor. The impact of his patents will continue to influence technological developments for years to come.