The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2013
Filed:
Oct. 30, 2002
Yoshiaki Ikuta, Yokohama, JP;
Shinya Kikugawa, Yokohama, JP;
Akio Masui, Tokyo, JP;
Noriaki Shimodaira, Yokohama, JP;
Shuhei Yoshizawa, Tokyo, JP;
Yoshiaki Ikuta, Yokohama, JP;
Shinya Kikugawa, Yokohama, JP;
Akio Masui, Tokyo, JP;
Noriaki Shimodaira, Yokohama, JP;
Shuhei Yoshizawa, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A process for producing a synthetic silica glass optical component which contains at least 1×10molecules/cmand has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1×10molecules/cmat a temperature of from 300 to 600° C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.