Singapore, Singapore

Yongzhe Zhang

This inventor holds 1 USPTO granted patent. Top assignee: Nanyang Technological University. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yongzhe Zhang. Retrieved from https://idiyas.com/inventor/yongzhe-zhang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Yongzhe Zhang: Innovator in Graphene Photodetector Technology

Introduction

Yongzhe Zhang is a prominent inventor based in Singapore, known for his contributions to the field of graphene technology. He has developed innovative methods that enhance the functionality of photodetectors, which are crucial in various applications, including imaging and sensing technologies.

Latest Patents

Yongzhe Zhang holds a patent for a "Method of manufacturing a monolayer graphene photodetector." This patent describes a method that includes forming a graphene quantum dot array in a graphene monolayer and creating an electron trapping center within that array. This advancement is significant as it improves the efficiency and performance of monolayer graphene photodetectors.

Career Highlights

Zhang is affiliated with Nanyang Technological University, where he conducts research and development in advanced materials and their applications. His work has garnered attention for its potential to revolutionize the field of photodetection.

Collaborations

One of his notable collaborators is Qijie Wang, with whom he has worked on various projects related to graphene technology. Their partnership has led to significant advancements in the understanding and application of graphene in electronic devices.

Conclusion

Yongzhe Zhang's innovative work in graphene photodetector technology exemplifies the potential of advanced materials in modern applications. His contributions continue to influence the field and inspire future research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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