Yongyong He

Title: Yongyong He: Innovator in Metal Film Measurement Technologies

Introduction

Yongyong He is a renowned inventor hailing from Beijing, China, known for his significant contributions to the field of measurement technologies. With a total of three patents to his name, he has developed innovative devices and methods that improve the accuracy of film thickness measurements, particularly in semiconductor applications.

Latest Patents

Among his latest inventions, Yongyong He has created a "Device for globally measuring thickness of metal film." This device includes a base, a rotating unit featuring a fixed member and a rotating member with a joint, and a working table equipped with a vacuum passage. A linear driving unit is integrated into the system, along with a cantilever beam and measuring head containing an eddy current probe aimed at precisely gauging the thickness of metal films.

Additionally, he has devised a "Method for measuring thickness of film on wafer edge," which involves an intricate process of off-line detection using a four-point probe method. This method ensures accurate measurement by determining a correction factor based on real film thickness, thereby allowing for precise thickness measurements at the edge of a wafer.

Career Highlights

Yongyong He has garnered substantial experience through his tenure at reputable institutions, including Hwatsing Technology Co., Ltd. and Tsinghua University. His role in these organizations has enabled him to refine his innovative ideas and transform them into practical applications in the industry.

Collaborations

Throughout his career, Yongyong has collaborated with esteemed colleagues like Xinchun Lu and Pan Shen. These partnerships have fostered a conducive environment for shared ideas and advancements in measurement technology, amplifying the impact of his innovative work.

Conclusion

With his impressive portfolio of patents and contributions to the technology sector, Yongyong He continues to pave the way for advancements in metal film measurement. His dedication to innovation positions him as a significant figure in the field, promising to influence future developments in semiconductor technology and beyond.