Yongin, South Korea

Yongseung Shin

This inventor holds 1 USPTO granted patent and 4 published patent applications and 1 EPO patent. Top assignee: Samsung Sdi., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yongseung Shin. Retrieved from https://idiyas.com/inventor/yongseung-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yongseung Shin: Innovator in Clearance Measurement Technology

Introduction

Yongseung Shin is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of measurement technology, particularly with his innovative clearance measuring apparatus. His work exemplifies the intersection of engineering and practical application in manufacturing processes.

Latest Patents

Yongseung Shin holds a patent for a clearance measuring apparatus. This invention includes an image sensor within a mold that consists of a frame, a punch, and a die. The image sensor captures images of the space between the punch and the die, while a controller measures the clearance based on the captured images. This technology enhances precision in manufacturing by ensuring accurate measurements of component spacing.

Career Highlights

Yongseung Shin is currently employed at Samsung SDI, Ltd., a leading company in the field of energy solutions and advanced materials. His role at Samsung SDI allows him to apply his innovative ideas in a practical setting, contributing to the company's reputation for cutting-edge technology.

Collaborations

Yongseung Shin has collaborated with talented coworkers, including Heetaek Lim and Seungjun Lee. Their combined expertise fosters a creative environment that drives innovation within their projects.

Conclusion

Yongseung Shin's contributions to clearance measurement technology reflect his dedication to innovation and excellence. His patent and work at Samsung SDI highlight the importance of precision in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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