This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Samsung Electronics Co., Ltd., Samsung Electronics Ltd.. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2024-2026
Title: Yongchul Jeong: Innovator in Pattern Formation Technology
Introduction
Yongchul Jeong is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of pattern formation technology, particularly in the semiconductor industry. His innovative methods have the potential to enhance manufacturing processes and improve product quality.
Latest Patents
Yongchul Jeong holds a patent for a method of forming a pattern. This method involves several steps, including the formation of an etching object layer on a substrate. A photoresist layer, which contains metal, oxygen, and an organic material, is then applied to the etching object layer. An exposure process is conducted on the photoresist layer, followed by a developing process that results in a photoresist pattern made of metal oxide. To eliminate any residue from the photoresist layer that contains organic material, ozone is introduced onto the substrate. Finally, the etching object layer is etched using the photoresist pattern as a mask.
Career Highlights
Yongchul Jeong is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and technology sector. His work at Samsung has allowed him to apply his innovative ideas in a practical setting, contributing to the company's advancements in technology.
Collaborations
Yongchul Jeong has collaborated with several talented individuals in his field, including Sangjin Kim and Yigwon Kim. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.
Conclusion
Yongchul Jeong is a prominent inventor whose work in pattern formation technology has the potential to revolutionize manufacturing processes in the semiconductor industry. His innovative methods and collaborations with other professionals highlight his commitment to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile