Hwaseong, South Korea

Yong Kug Bae

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yong Kug Bae. Retrieved from https://idiyas.com/inventor/yong-kug-bae-6f9i084v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Yong Kug Bae: Innovator in Semiconductor Technology

Introduction

Yong Kug Bae is a prominent inventor based in Hwaseong, South Korea. He is known for his contributions to the field of semiconductor technology. His innovative methods have significantly impacted the development of semiconductor devices.

Latest Patents

Yong Kug Bae holds a patent for a method of forming a pattern of a semiconductor device. This method involves several intricate steps, including the formation of a mask and a sacrificial layer on a substrate. The process includes etching the sacrificial layer to create units of specific widths and distances, forming a spacer, and etching the mask in designated regions. This patent showcases his expertise in semiconductor fabrication.

Career Highlights

Yong Kug Bae is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. His contributions have been vital in enhancing the efficiency and performance of semiconductor devices.

Collaborations

Yong Kug Bae has collaborated with notable colleagues, including Hyun Chang Lee and Kwang Sub Yoon. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Yong Kug Bae is a key figure in the semiconductor industry, with a focus on innovative methods that enhance device performance. His work at Samsung Electronics Co., Ltd. and his patent contributions reflect his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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