Taipei, Taiwan

Yong-Jian Liu

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yong-Jian Liu. Retrieved from https://idiyas.com/inventor/yong-jian-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Yong-Jian Liu: Innovator in Cerium Dioxide Manufacturing

Introduction

Yong-Jian Liu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the manufacturing of cerium dioxide powder. His innovative methods have the potential to impact various industrial applications.

Latest Patents

Yong-Jian Liu holds a patent for a "Method of manufacturing cerium dioxide powder and cerium dioxide powder." This patent describes a process that involves mixing a cerium salt, an amine, and a solvent to create a mixed solution. The method utilizes a solvothermal reaction to produce cerium dioxide powder, which is essential for various applications in electronics and catalysis.

Career Highlights

Yong-Jian Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on developing advanced materials that enhance the performance of semiconductor devices. With 1 patent to his name, Liu continues to push the boundaries of innovation in his field.

Collaborations

Yong-Jian Liu has collaborated with talented colleagues such as Chung-Hsin Lu and Shu-Hao Huang. Their combined expertise contributes to the advancement of research and development in materials science.

Conclusion

Yong-Jian Liu's contributions to the manufacturing of cerium dioxide powder exemplify the spirit of innovation in the semiconductor industry. His work not only enhances material properties but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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