Funabashi, Japan

Yoichiro Fujita


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 24(Granted Patents)


Location History:

  • Minamisaitama-gun, JP (2000)
  • Funabashi, JP (2005)

Company Filing History:


Years Active: 2000-2005

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2 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Cleaning: The Contributions of Yoichiro Fujita

Introduction

Yoichiro Fujita, an esteemed inventor based in Funabashi, Japan, has made significant strides in the field of semiconductor fabrication. With a total of two patents to his name, Fujita has focused on creating formulations that enhance the efficiency and effectiveness of cleaning processes in semiconductor technology.

Latest Patents

Fujita's latest patents revolve around two innovative formulations aimed at improving wafer cleaning processes. The first patent focuses on a formulation containing maleic acid and ethylene urea designed specifically for removing residue from semiconductor substrates. This formulation is critical in semiconductor fabrication, as it effectively cleans residue left on wafers after a resist ashing process. The preferred composition includes maleic acid, ethylene urea, additional carboxylic acids, organic amines, and water, with optional ingredients like organic solvents, chelating agents, and surfactants. This invention is particularly beneficial for wafers with delicate copper interconnects and low-k or ultra low-k interlayer dielectric structures.

Another notable patent involves a benzimidazole compound, which further contributes to the advancement of cleaning techniques in the semiconductor industry.

Career Highlights

Fujita works at Nissan Chemical Industries Limited, a reputable company known for its innovative solutions in chemical manufacturing. His dedication to developing cutting-edge technologies has positioned him as a key player in the semiconductor cleaning sector. With a focus on enhancing product performance, his contributions continue to be invaluable.

Collaborations

Throughout his career, Fujita has collaborated with esteemed colleagues, including Tomoe Miyazawa and Ichiro Kobayashi. Together, they have contributed to significant advancements in chemical formulations and cleaning processes, demonstrating the power of teamwork in driving innovation.

Conclusion

Yoichiro Fujita stands out as an influential inventor whose work in semiconductor cleaning formulations has paved the way for greater efficiency in semiconductor fabrication. With his innovative patents, he has significantly impacted the industry, and his collaborations with fellow professionals underscore the importance of collective effort in achieving groundbreaking advancements.

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