Tokyo, Japan

Yoichi Fukushima

USPTO Granted Patents = 14 

Average Co-Inventor Count = 2.0

ph-index = 8

Forward Citations = 268(Granted Patents)


Company Filing History:


Years Active: 1989-2016

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14 patents (USPTO):Explore Patents

Title: The Innovative Mind of Yoichi Fukushima

Introduction: Yoichi Fukushima, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With a portfolio of 14 patents, his work showcases his dedication to advancing technology and improving semiconductor manufacturing processes.

Latest Patents: Among his latest innovations, Fukushima has developed a semiconductor device and a method for manufacturing the same. His approach aims to reduce contact resistance by forming a metal silicide layer with an optimal thickness at the interface between a polycrystalline silicon plug and an upper conductive plug. Notably, the polycrystalline silicon plug contains germanium, which is ion-implanted prior to the formation of the metal silicide layer. Additionally, he has devised a comprehensive method for manufacturing semiconductor devices that includes the formation of first and second gate electrodes over a semiconductor substrate, selectively forming an epitaxial layer, and introducing impurities to create specific impurity regions adjacent to the gate electrodes.

Career Highlights: Fukushima's career is marked by his associations with notable companies such as Kyodo Printing Co., Ltd. and Elpida Memory, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations: Throughout his career, Yoichi Fukushima has collaborated with esteemed colleagues, including Minoru Fujita and Yuji Kakinuma. These partnerships have fostered an environment of creativity and innovation, leading to significant advancements in the industry.

Conclusion: Yoichi Fukushima's work exemplifies the spirit of innovation in the field of semiconductor technology. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, paving the way for future advancements. As he continues to push the boundaries of technology, his contributions are set to have a lasting impact on the industry.

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