Hitachi, Japan

Yohsuke Inoue


Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 55(Granted Patents)


Location History:

  • Tokai-mura, JP (1998)
  • Ibaraki, JP (1993 - 2001)
  • Hitachi, JP (2002)

Company Filing History:


Years Active: 1993-2002

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Innovations of Yohsuke Inoue

Introduction

Yohsuke Inoue is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on improving the efficiency and effectiveness of semiconductor wafer processing.

Latest Patents

Inoue's latest patents include a semiconductor wafer processing apparatus designed for transferring a wafer mount. This apparatus features a reaction furnace capable of heating, a wafer mount for supporting a semiconductor wafer, and a transfer device that allows for horizontal movement of the wafer mount into and out of the reaction furnace. Another significant patent is a substrate processing apparatus that includes a substrate processing chamber and a transfer chamber. This apparatus is equipped with a substrate lifting member and two arms that facilitate the horizontal and vertical movement of substrates during processing.

Career Highlights

Throughout his career, Yohsuke Inoue has worked with prominent companies such as Hitachi, Ltd. and Kokusai Electric Co., Ltd. His experience in these organizations has allowed him to develop innovative solutions in semiconductor processing.

Collaborations

Inoue has collaborated with notable colleagues, including Takaya Suzuki and Toshiyuki Ohno. Their combined expertise has contributed to advancements in the semiconductor industry.

Conclusion

Yohsuke Inoue's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the efficiency of semiconductor processing.

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