Higashimurayama, Japan

Yohichi Yamaguchi


Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 102(Granted Patents)


Location History:

  • Tokyo, JP (1990)
  • Higashimurayama, JP (1993 - 1995)

Company Filing History:

goldMedal3 out of 2,528 
 
Hoya Corporation
 patents
silverMedal1 out of 832,718 
Other
 patents
where one patent can have more than one assignee

Years Active: 1990-1995

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3 patents (USPTO):Explore Patents

Title: Yohichi Yamaguchi: Innovator in Silicon Carbide Film Technology

Introduction

Yohichi Yamaguchi is a notable inventor based in Higashimurayama, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the formation of silicon carbide films. With a total of 3 patents to his name, Yamaguchi's work has advanced the capabilities of silicon carbide applications in various industries.

Latest Patents

Yamaguchi's latest patents include innovative processes for the formation of silicon carbide films. One of his patents describes a process for the formation of SiC films using a low-pressure CVD method with a hot-wall type reactor. In this process, dichlorosilane gas and acetylene gas are utilized as source gases. The flow velocity of these gases in the reactor is set at not less than 70 cm/second, and the reactor is heated to a temperature not exceeding 1,000 degrees Celsius. This method allows for the production of SiC films with excellent uniformity in thickness and properties, achieving high mass productivity without damaging the reactor during film formation.

Another patent outlines a method for forming silicon carbide films using a hot-wall type CVD apparatus. This method involves placing a substrate in a reaction tube, reducing the pressure while heating the tube, and introducing multiple gases into the reaction tube. The silicon carbide film is formed on the substrate by alternately repeating specific procedures involving acetylene gas and dichlorosilane gas.

Career Highlights

Throughout his career, Yohichi Yamaguchi has worked with prominent companies, including Hoya Corporation. His expertise in semiconductor technology has positioned him as a key figure in the development of advanced materials for electronic applications.

Collaborations

Yamaguchi has collaborated with notable colleagues such as Hiroyuki Nagasawa and Masaru Nishikawa. These collaborations have contributed to the advancement of silicon carbide film technology and its applications.

Conclusion

Yohichi Yamaguchi's innovative work in the field of silicon carbide film technology has made a lasting impact on the semiconductor industry. His patents reflect a commitment to advancing material science and engineering, paving the way for future developments in this critical area.

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