Tokyo, Japan

Yohei Hamano

This inventor holds 1 USPTO granted patent. Top assignee: Japan Science and Technology Agency. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yohei Hamano. Retrieved from https://idiyas.com/inventor/yohei-hamano-98auick3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Yohei Hamano: Innovator in Bubble-Jetting Technology

Introduction

Yohei Hamano is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of bubble-jetting technology. His work has led to advancements that facilitate the fabrication and mass production of specialized devices.

Latest Patents

Hamano holds a patent for a bubble-jetting chip, which includes a localized ablation device and method, as well as an injection device and method. This invention enables the mass production of a bubble-jetting chip that features multiple bubble jetting portions of uniform size. The design includes a substrate with a bubble-jetting portion that consists of a conductive electrode and an insulating portion made from photosensitive resin. This innovative structure allows for efficient production and functionality.

Career Highlights

Hamano is affiliated with the Japan Science and Technology Agency, where he continues to push the boundaries of technology. His work has garnered attention for its potential applications in various fields, including medical devices and precision engineering.

Collaborations

Some of his notable coworkers include Yoko Yamanishi and Takuya Kambayashi, who contribute to the collaborative environment that fosters innovation at the Japan Science and Technology Agency.

Conclusion

Yohei Hamano's contributions to bubble-jetting technology exemplify the spirit of innovation. His patent reflects a significant advancement in the field, showcasing his dedication to enhancing manufacturing processes. His work continues to inspire future developments in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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