This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Corporation. Active years: 2021.
Company Filing History:
Years Active: 2021
Title: Yisha Mao - Innovator in Amorphous Carbon Layer Processing
Introduction
Yisha Mao is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods for processing amorphous carbon layers.
Latest Patents
Yisha Mao holds a patent for an "Amorphous carbon layer opening process." This patent describes a method for opening an amorphous carbon layer mask below a hardmask. The process involves performing one or more cycles, each consisting of an amorphous carbon layer mask opening phase and a cleaning phase. During the opening phase, an opening gas containing an oxygen component is flowed into a plasma processing chamber, creating a plasma that etches features in the amorphous carbon layer mask. The cleaning phase follows, where a cleaning gas containing hydrogen, carbon, and halogen components is introduced to further refine the process.
Career Highlights
Yisha Mao is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Yisha has collaborated with talented coworkers, including Ce Qin and Yansha Jin, contributing to innovative projects within the company.
Conclusion
Yisha Mao's contributions to the field of semiconductor manufacturing through his patented processes demonstrate his expertise and commitment to innovation. His work continues to influence advancements in technology and manufacturing efficiency.