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Years Active: 2002-2011
Title: Yiping Xu: Innovator in Spectroscopic Technology
Introduction
Yiping Xu is a prominent inventor based in Cupertino, CA, known for his contributions to the field of spectroscopic technology. With a total of 5 patents to his name, he has made significant advancements in the measurement of diffracting structures on semiconductor wafers.
Latest Patents
One of Yiping Xu's latest patents is a spectroscopic scatterometer system. This innovative system measures the diffraction from a diffracting structure on a semiconductor wafer. Before this measurement, the film thickness and index of refraction of the films underneath the structure are first determined using spectroscopic reflectometry or spectroscopic ellipsometry. A rigorous model is then employed to calculate the intensity or ellipsometric signatures of the diffracting structure. The structure is subsequently measured using a spectroscopic scatterometer that utilizes polarized and broadband radiation to obtain an intensity or ellipsometric signature. This signature is then matched with existing signatures in a database to ascertain the grating shape parameters of the structure.
Career Highlights
Yiping Xu has worked with notable companies such as Kla Tencor Corporation and KLA-Tencor Technologies Corporation. His experience in these organizations has contributed to his expertise in the field of semiconductor technology and spectroscopic measurement.
Collaborations
Yiping has collaborated with several professionals in his field, including Ibrahim Abdulhalim and Ibrahim Abdulhalm. These collaborations have further enriched his work and innovations.
Conclusion
Yiping Xu's contributions to spectroscopic technology and his innovative patents have made a significant impact in the semiconductor industry. His work continues to influence advancements in measurement techniques and technology development.