Yinle Li

Title: Innovations of Yinle Li in Fault Isolation Technology

Introduction

Yinle Li is an accomplished inventor based in Guangzhou, China. He has made significant contributions to the field of fault isolation technology, particularly through his innovative patent. His work focuses on enhancing the reliability and efficiency of electronic devices.

Latest Patents

Yinle Li holds a patent titled "Method and apparatus for fault isolation, computer device, medium and program product." This patent describes a method for fault isolation that involves acquiring a thermal imaging picture of a surface of a to-be-tested chip. The thermal imaging picture is obtained by scanning the chip with a test signal applied through an infrared thermal imaging device. The method further includes analyzing the thermal imaging picture to determine the phase angle of each point on the chip's surface. Additionally, a three-dimensional image of the chip's surface is acquired and analyzed to obtain the three-dimensional coordinates of each point. Ultimately, the method calculates the three-dimensional coordinates of any faults present in the chip.

Career Highlights

Yinle Li is currently employed at the China Electronics Reliability and Environmental Testing Institute. His role at this esteemed institution allows him to apply his expertise in fault isolation and contribute to advancements in electronic testing and reliability.

Collaborations

Yinle Li collaborates with notable colleagues, including Chao Pang and Yiqiang Ni. Their combined efforts in research and development have furthered the understanding and application of fault isolation techniques.

Conclusion

Yinle Li's innovative work in fault isolation technology exemplifies the importance of advancements in electronic reliability. His contributions, particularly through his patent, highlight the potential for improved testing methods in the electronics industry.