YiNing Pan

Title: YiNing Pan: Innovator in Optical Proximity Correction

Introduction

YiNing Pan is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of optical proximity correction (OPC) through his innovative techniques. His work focuses on enhancing the accuracy of layout designs in semiconductor manufacturing.

Latest Patents

YiNing Pan holds a patent titled "Edge fragment correlation determination for optical proximity correction." This invention relates to techniques for determining edge fragment correlation information. The invention involves determining image intensity slope information for edge fragments in a layout design. This information describes how image intensity for each edge fragment changes with its position. Additionally, image amplitude sensitivity information for the edge fragments is determined, which describes how image amplitude changes with the positions of neighboring edge fragments. By utilizing both the image intensity slope information and the image amplitude sensitivity information, edge fragment correlation information is established. This correlation information can then be used to process the layout design using OPC techniques, either on the entire layout or on problematic regions identified by conventional OPC processes.

Career Highlights

YiNing Pan is associated with Mentor Graphics Corporation, a leading company in electronic design automation. His work at the company has been instrumental in advancing the field of semiconductor design and manufacturing.

Collaborations

YiNing has collaborated with notable colleagues, including Junjiang Lei and Le Hong, who have contributed to his research and development efforts.

Conclusion

YiNing Pan's innovative work in optical proximity correction has made a significant impact on the semiconductor industry. His patent demonstrates the importance of edge fragment correlation in improving layout designs. His contributions continue to influence advancements in electronic design automation.