Shanghai, China

Yinghua Piao

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2014-2015

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2 patents (USPTO):Explore Patents

Title: Yinghua Piao: Innovator in Microelectronic Device Technologies

Introduction

Yinghua Piao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of microelectronic device technologies. With a total of two patents to his name, Piao's work focuses on advancing the capabilities of field-effect transistors.

Latest Patents

Piao's latest patents include an asymmetric source-drain field-effect transistor having a mixed Schottky/P-N junction and a method for making it. This invention relates to microelectronic device technologies and discloses a method for creating an asymmetric source-drain field-effect transistor structure. The unique design is achieved by altering ion implantation tilt angles to control the locations of doped regions formed through two ion implantation processes. The resulting transistor features structurally asymmetric source/drain regions, with one region formed of a P-N junction and the other consisting of a mixed junction, which combines elements of both a Schottky junction and a P-N junction.

Another notable patent is for a Schottky junction source/drain transistor and the method of making it. This method involves several steps, including providing a semiconductor substrate, forming a gate stack, and creating an insulating layer. The process also includes etching the depleting layer and the insulating layer, followed by the formation of a metal layer and thermal annealing. The innovation ensures that the metal on the sidewalls is absorbed during the annealing process, preventing diffusion toward the semiconductor layer. This results in ultra-thin and uniform Schottky junctions with controllable and suppressed lateral growth.

Career Highlights

Yinghua Piao is affiliated with Fudan University, where he continues to engage in research and development in the field of microelectronics. His work has garnered attention for its potential applications in various electronic devices.

Collaborations

Piao has collaborated with notable colleagues, including Dongping Wu and Shili Zhang, contributing to advancements in their shared field of expertise.

Conclusion

Yinghua Piao's innovative work in microelectronic device technologies, particularly in the development of advanced field-effect transistors, showcases his significant impact on the industry. His contributions continue to pave the way for future advancements in electronics.

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