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For the Inventor, By the Inventor

Cupertino, CA, United States of America

Ying Yu

This inventor holds 6 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2000-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ying Yu. Retrieved from https://idiyas.com/inventor/ying-yu-q0277v9w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 83.3

Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 170(Granted Patents)


Company Filing History:

goldMedal6 out of 14,482 
 
Applied Materials, Inc.
 patents

Years Active: 2000-2004

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6 patents (USPTO):Explore Patents
1. 6820298 - Wafer scrubbing device having brush assembly and mounting assembly forming spherical joint (2004-11-23),
2. 6797643 - Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power (2004-09-28),
3. 6645884 - Method of forming a silicon nitride layer on a substrate (2003-11-11),
4. 6586343 - Method and apparatus for directing constituents through a processing chamber (2003-07-01),
5. 6436192 - Apparatus for aligning a wafer (2002-08-20),
6. 6063440 - Method for aligning a wafer (2000-05-16),

Title: Ying Yu - Innovator in Semiconductor Technology

Introduction

Ying Yu is a prominent inventor based in Cupertino, CA, known for his contributions to semiconductor technology. With a total of 6 patents to his name, he has made significant advancements in the field, particularly in wafer scrubbing devices and low dielectric constant film deposition methods.

Latest Patents

Ying Yu's latest patents include a "Wafer scrubbing device having brush assembly and mounting assembly forming spherical joint." This innovative brush mounting system features a brush mandrel and a mounting assembly that allows for a spherical joint at the point of contact, enhancing the efficiency of wafer scrubbing. Another notable patent is for "Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power." This method involves depositing a low dielectric constant film on a substrate using a gas mixture and a very high frequency power source, which is crucial for semiconductor manufacturing.

Career Highlights

Ying Yu is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing advanced technologies that improve the performance and reliability of semiconductor devices.

Collaborations

Ying has collaborated with notable coworkers such as Henry Ho and Steven Yencheng Chen, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Ying Yu's innovative work and patents have significantly impacted the semiconductor industry, showcasing his expertise and dedication to advancing technology. His contributions continue to influence the development of efficient manufacturing processes in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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