Ying-Yu Lai

Title: Ying-Yu Lai: Innovator in Transistor Technology

Introduction

Ying-Yu Lai is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the design and fabrication of transistors. With a total of 2 patents to his name, Lai continues to push the boundaries of innovation in his field.

Latest Patents

One of Ying-Yu Lai's latest patents is titled "Extended side contacts for transistors and methods forming same." This patent describes a method that includes forming a source/drain region for a transistor, followed by the creation of a first inter-layer dielectric over the source/drain region. The process involves forming a lower source/drain contact plug that electrically couples to the source/drain region and extends into the first inter-layer dielectric. Additionally, the method outlines the deposition of an etch stop layer over the first inter-layer dielectric and the lower source/drain contact plug. A second inter-layer dielectric is then deposited over the etch stop layer, and an etching process is performed to create an opening that exposes the top surface and sidewall of the lower source/drain contact plug. Finally, an upper source/drain contact plug is formed in the opening.

Career Highlights

Ying-Yu Lai is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing transistor technology, which is crucial for the development of modern electronic devices.

Collaborations

Lai has collaborated with notable colleagues, including Chih-Hsuan Lin and Hsi Chung Chen. These partnerships have contributed to the innovative projects and patents that have emerged from their collective expertise.

Conclusion

Ying-Yu Lai is a key figure in the field of semiconductor technology, with a focus on transistor innovation. His patents and collaborations reflect his commitment to advancing technology in this critical area.