Ying Xiao

Title: Innovations of Inventor Ying Xiao

Introduction

Ying Xiao is a notable inventor based in San Jose, CA, who has made significant contributions to the field of plasma confinement and etching methods. With a total of 3 patents to his name, he has demonstrated a commitment to advancing technology in his area of expertise.

Latest Patents

Ying Xiao's latest patents include a method and apparatus for magnetic confinement of a plasma. This invention provides an innovative approach to confining plasma using a magnetic field that selectively restricts the movement of charged species. The apparatus includes a substrate support and a magnetic field forming device, which work together to create a controlled environment for plasma formation. Another significant patent involves methods for etching a dielectric barrier layer with high selectivity. This method allows for the selective etching of a dielectric barrier layer while preserving the integrity of the underlying dielectric bulk insulating layer.

Career Highlights

Ying Xiao is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to collaborate on cutting-edge technologies that are essential for modern manufacturing processes.

Collaborations

Throughout his career, Ying has worked alongside talented colleagues, including Gerardo Delgadino and Steven C Shannon. These collaborations have contributed to the successful development of innovative solutions in their respective fields.

Conclusion

Ying Xiao's contributions to the field of plasma confinement and etching methods highlight his role as a significant inventor. His patents reflect a deep understanding of complex processes and a commitment to innovation.