The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Nov. 28, 2006
Steven C. Shannon, San Mateo, CA (US);
Masao Drexel, Santa Cruz, CA (US);
James A. Stinnett, Yorba Linda, CA (US);
Ying Rui, Sunnyvale, CA (US);
Ying Xiao, San Jose, CA (US);
Roger A. Lindley, Santa Clara, CA (US);
Imad Yousif, San Jose, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Masao Drexel, Santa Cruz, CA (US);
James A. Stinnett, Yorba Linda, CA (US);
Ying Rui, Sunnyvale, CA (US);
Ying Xiao, San Jose, CA (US);
Roger A. Lindley, Santa Clara, CA (US);
Imad Yousif, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for confining a plasma are provided herein. In one embodiment, an apparatus for confining a plasma includes a substrate support and a magnetic field forming device for forming a magnetic field proximate a boundary between a first region disposed at least above the substrate support, where a plasma is to be formed, and a second region, where the plasma is to be selectively restricted. The magnetic field has b-field components perpendicular to a direction of desired plasma confinement that selectively restrict movement of charged species of the plasma from the first region to the second region dependent upon the process conditions used to form the plasma.