Singapore, Singapore

Ying Li Fan


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Ying Li Fan - Innovator in Semiconductor Manufacturing

Introduction

Ying Li Fan is a prominent inventor based in Singapore, known for his contributions to the field of semiconductor manufacturing. He has developed innovative methods that enhance the efficiency and reliability of manufacturing processes. His work is particularly significant in identifying potential issues that can affect production yields.

Latest Patents

Ying Li Fan holds a patent titled "Method to identify machines causing excursion in semiconductor manufacturing." This invention discloses a method that recognizes and utilizes the grouping patterns of process material by different machines at various process steps. It aims to identify potential problem machines that may cause excursions in semiconductor manufacturing. Such excursions could lead to yield problems during the final test or at any inline electrical testing, metrology measurement, or inspection at different process steps. The method lists potential problematic machines in order of their likelihood of causing issues, thereby streamlining the troubleshooting process.

Career Highlights

Ying Li Fan is currently employed at Tech Semiconductor Singapore Pte Ltd, where he applies his expertise in semiconductor manufacturing. His role involves working on innovative solutions that improve manufacturing processes and product quality. His dedication to advancing technology in this field has made him a valuable asset to his company.

Collaborations

Ying Li Fan collaborates with various professionals in the semiconductor industry, including his coworker Choy Yow Ng. Together, they work on projects that aim to enhance manufacturing efficiency and address challenges in the production process.

Conclusion

Ying Li Fan's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to improving industry standards. His work not only addresses current challenges but also paves the way for future advancements in the field.

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