Ying-Hao Li

Title: Innovations by Inventor Ying-Hao Li

Introduction

Ying-Hao Li is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With a total of 2 patents, his work focuses on etching compositions and galvanizing solutions that enhance the efficiency and effectiveness of metal film applications.

Latest Patents

Ying-Hao Li's latest patents include an etchant composition for multilayered metal films of copper and molybdenum, as well as a method for prolonging the life of this composition. The etchant composition is designed to etch en bloc a multilayered metal film, effectively preventing undercutting of the molybdenum layer. It comprises hydrogen peroxide, an organic acid, an amine compound, an azole, and a hydrogen peroxide stabilizer, ensuring stability and ease of use. Additionally, he has developed a novel galvanizing solution for the galvanic deposition of copper, utilizing hydroxylamine sulfate or hydroxylamine hydrochloride as addition reagents during the deposition process.

Career Highlights

Throughout his career, Ying-Hao Li has worked with prominent companies such as Merck Patent Gesellschaft mit beschränkter Haftung and Kanto Kagaku Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in the field of semiconductor technology and patent development.

Collaborations

Ying-Hao Li has collaborated with notable colleagues, including Jung-Chih Hu and Wu-Chun Gau. These partnerships have likely fostered innovation and advancement in their respective projects.

Conclusion

Ying-Hao Li's contributions to the field of semiconductor manufacturing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future developments.