Katy, TX, United States of America

Ying H Tsang

USPTO Granted Patents = 2 


 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013-2017

Loading Chart...
Loading Chart...
Loading Chart...
2 patents (USPTO):

Title: Innovations of Ying H Tsang

Introduction

Ying H Tsang is a notable inventor based in Katy, TX (US). He has made significant contributions to the field of chemical formulations and semiconductor technology. With a total of 2 patents, his work has had a considerable impact on various industrial applications.

Latest Patents

One of his latest patents is a water-based formulation of H2S/mercaptan scavenger for fluids in oilfield and refinery applications. This invention focuses on chemicals that effectively remove hydrogen sulfide (HS) and/or mercaptans from gas, oil, and water. The water-based formulations utilize scavenging compounds that can be tailored to include various functional groups, enhancing their effectiveness as HS scavengers. Another significant patent involves a method of enhancing photoresist adhesion to rare earth oxides. This method improves the fabrication of metal gate electrodes over high-k gate dielectric layers by treating the surface of rare earth oxide capping layers with an oxygen-free plasma process.

Career Highlights

Ying H Tsang has worked with prominent companies such as Freescale Semiconductor, Inc. and Baker Hughes Corporation. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in the industry.

Collaborations

Throughout his career, Tsang has collaborated with talented individuals, including James Kenyon Schaeffer III and Eric D Luckowski. These partnerships have contributed to the advancement of his research and inventions.

Conclusion

Ying H Tsang's contributions to the fields of chemical formulations and semiconductor technology demonstrate his innovative spirit and dedication to solving real-world problems. His patents reflect a commitment to advancing technology and improving industrial processes.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…