Newburgh, NY, United States of America

Ying H Tsang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 123(Granted Patents)


Company Filing History:


Years Active: 2011-2012

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: **Innovator Ying H Tsang: Pioneering Advances in Photoresist Techniques**

Introduction

Ying H Tsang, a notable inventor located in Newburgh, NY, has made significant contributions to the field of semiconductor manufacturing. With four patents to his name, Tsang's work primarily focuses on innovative methods related to photoresist processes and materials.

Latest Patents

Among Tsang's latest inventions is a patent for "Methods for removing a photoresist from a metal-comprising material." This method involves applying a substantially non-aqueous-based solvent to the photoresist, followed by an aqueous-based fluid to effectively remove the photoresist from metal-comprising materials. This innovation enhances the efficiency and effectiveness of photolithography processes in the semiconductor industry.

Another recent patent details a "Method for forming dual high-K metal gate using photoresist mask and structures thereof." This method encompasses depositing a high-k dielectric film on a substrate of a Front-End-of-the-Line (FEOL) Complementary Metal-Oxide-Semiconductor (CMOS) structure. It includes steps for patterning the high-k dielectric according to a photoresist mask and implementing advanced techniques for removing residual photoresist, thus minimizing any organic contaminants through processes involving nitrogen-hydrogen forming gas or ammonia.

Career Highlights

Ying H Tsang has built an impressive career in the semiconductor field, having worked with industry leaders such as GlobalFoundries Inc. and International Business Machines Corporation (IBM). His role in these organizations has positioned him at the forefront of technological advancements in semiconductor fabrication.

Collaborations

Throughout his career, Tsang has collaborated with esteemed colleagues, including Michael Patrick Chudzik and Rashmi Jha. These partnerships have fostered an environment of innovation and knowledge sharing, ultimately contributing to the success of his inventions.

Conclusion

Ying H Tsang exemplifies the spirit of innovation within the semiconductor industry. His patented methods for handling photoresist materials not only advance manufacturing techniques but also pave the way for future developments in this vital sector. As he continues to push boundaries in technology, Tsang remains a key figure to watch in the realm of semiconductor innovation.

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