Helsinki, Finland

Yille A Saanila


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2006

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yille A Saanila: Innovator in Integrated Circuit Technology

Introduction

Yille A Saanila is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of integrated circuits, particularly in the area of damascene metallization. His innovative work has led to the development of advanced methods and structures that enhance the performance of integrated circuits.

Latest Patents

Yille A Saanila holds 1 patent for his invention titled "Conformal lining layers for damascene metallization." This patent describes a method and structures for conformal lining of dual damascene structures in integrated circuits. The process involves forming trenches and contact vias in insulating layers, which are then exposed to alternating chemistries to create monolayers of a desired lining material. The exemplary process flows include alternately pulsed metal halide and ammonia gases injected into a constant carrier flow. This innovative approach allows for self-terminated metal layers to react with nitrogen, achieving near-perfect step coverage while minimizing the thickness required for a diffusion barrier function. Consequently, this maximizes the volume of subsequent filling metal for any given trench and via dimensions.

Career Highlights

Yille A Saanila is currently employed at ASM International N.V., a company renowned for its advancements in semiconductor manufacturing equipment. His work at ASM has positioned him as a key player in the development of cutting-edge technologies that drive the industry forward.

Collaborations

Yille collaborates with talented professionals in his field, including Ivo Johannes Raaijmakers and Suvi P. Haukka. Their combined expertise contributes to the innovative projects at ASM International N.V.

Conclusion

Yille A Saanila's contributions to integrated circuit technology through his patent on conformal lining layers exemplify the importance of innovation in the semiconductor industry. His work continues to influence advancements in the field, showcasing the potential for future developments.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…