Company Filing History:
Years Active: 2014
Title: **Yilei Hua: Innovator in Projection-Type Photolithography**
Introduction
Yilei Hua, an esteemed inventor based in Beijing, China, has made significant contributions to the field of micro-nano fabrication. With a specialization in photolithography systems, Yilei has secured a patent that showcases his innovative approach to enhancing efficiency in manufacturing processes.
Latest Patents
Yilei Hua holds a patent for a "Projection-type photolithography system using composite photon sieve." This invention introduces a novel system that enhances the efficiency of conventional projection-type photolithography. By utilizing a composite photon sieve instead of a traditional projection objective lens, the system maintains high efficiency while enabling rapid batch processing and substantial cost reduction. The system consists of an integrated arrangement of a lighting system, mask plate, composite photon sieve, and substrate, which collectively work to improve photolithography efficiency and reduce overall system size.
Career Highlights
Yilei Hua is affiliated with the Chinese Academy of Sciences, where he applies his expertise in photolithography. His innovative endeavors reflect a deep commitment to advancing the technology and methods used in micro-nano fabrication. His singular patent not only reflects his technical skills but also his vision for improving industry standards.
Collaborations
Throughout his career, Yilei Hua has collaborated with notable colleagues, including Changqing Xie and Nan Gao. These partnerships have contributed to the development and refinement of innovative technologies in the field of photolithography.
Conclusion
Yilei Hua stands out as a pioneering inventor in the realm of projection-type photolithography systems. His patented innovation is a testament to his dedication to improving manufacturing processes and efficiency. As he continues his work at the Chinese Academy of Sciences, Yilei's contributions to the field are poised to significantly influence future advancements in micro-nano fabrication.