Pleasanton, CA, United States of America

Yijun Du

This inventor holds 2 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2014-2017.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2014-2017

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2 patents (USPTO):Explore Patents

Title: Yijun Du: Innovator in Gas Delivery Systems

Introduction

Yijun Du is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of gas delivery systems, particularly in plasma process systems. With a total of 2 patents, his work focuses on enhancing the efficiency and durability of gas delivery mechanisms.

Latest Patents

Yijun Du's latest patents include a coating method for gas delivery systems. This innovative method involves a process where the inner surfaces of gas passages are coated with a corrosion-resistant material. The coating is formed by curing a layer of fluidic precursor deposited on the inner surfaces. The steps include flowing a fluidic precursor through the gas passages, removing excess fluidic precursor, and curing the deposited layer to create a durable coating. This method is particularly beneficial for plasma etching systems, ensuring longevity and reliability in gas delivery.

Career Highlights

Yijun Du is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop and refine his innovative ideas, contributing to advancements in gas delivery systems.

Collaborations

Yijun has collaborated with several talented individuals, including Ian J Kenworthy and Duane Outka. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Yijun Du's contributions to gas delivery systems exemplify the importance of innovation in technology. His patents and work at Lam Research Corporation highlight his commitment to improving the efficiency and reliability of plasma process systems.

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