This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Hubei Dinghui Microelectronics Materials Co., Ltd. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Yijie Luo: Innovator in Polyurethane Polishing Technology
Introduction
Yijie Luo is a notable inventor based in Wuhan, China. He has made significant contributions to the field of chemical-mechanical planarization treatment through his innovative work on polyurethane polishing layers. His expertise and dedication to research have led to the development of a unique polishing pad that enhances the efficiency of polishing processes.
Latest Patents
Yijie Luo holds a patent for a polyurethane polishing layer, which includes a polishing pad and methods for preparing the polishing layer and planarizing materials. This invention is characterized by a polyurethane polishing layer that has a coefficient of thermal expansion ranging from 100-200 ppm/°C. The layer is created from a reaction product of multiple components, including an isocyanate-terminated prepolymer, a hollow microsphere polymer, and a curing agent composition. The curing agent composition consists of 5-55 wt % of an aliphatic diamine composition, 0-8 wt % of a polyamine composition, and 40-90 wt % of an aromatic bifunctional composition. The polyurethane polishing layer boasts a density of 0.6-1.1 g/cm³, a Shore hardness of 45-70D, and an elongation at break of 50-450%. This innovative layer is prepared through a simple process that is cost-effective and energy-efficient, while also providing high hydrolytic stability, uniform density, and a stable removal rate.
Career Highlights
Yijie Luo is currently employed at Hubei Dinghui Microelectronics Materials Co., Ltd. His work at this company has allowed him to focus on advancing polishing technologies that are crucial for various applications in the microelectronics industry. His contributions have not only enhanced product performance but have also paved the way for further innovations in the field.
Collaborations
Yijie Luo has collaborated with several talented individuals in his field, including Shunquan Zhu and Min Liu. These collaborations have fostered a productive environment for innovation and have contributed to the successful development of new technologies.
Conclusion
Yijie Luo's work in the development of polyurethane polishing layers represents a significant advancement in polishing technology. His innovative approach and dedication to research continue to impact the microelectronics industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile