Company Filing History:
Years Active: 2017
Title: Innovations of Yihua Liu in Electrochemical Deposition
Introduction
Yihua Liu is a notable inventor based in Gaithersburg, MD (US). He has made significant contributions to the field of electrochemical deposition, particularly in the controlled growth of platinum films. His innovative approach has implications for various advanced technologies.
Latest Patents
Yihua Liu holds a patent for a process titled "Self-terminating growth of platinum by electrochemical deposition." This patent describes a self-terminating rapid process for the controlled growth of platinum or platinum alloy monolayer films from a KPtCl—NaCl—NaBr electrolyte. The process allows for platinum deposition to be quenched at potentials just negative of proton reduction, utilizing an alteration of the double layer structure induced by a saturated surface coverage of underpotential deposited hydrogen. The surface can be reactivated for platinum deposition by adjusting the potential to more positive values, where underpotential deposited hydrogen is oxidized, making fresh sites for absorption of platinum chloride available. Periodic pulsing of the potential enables the sequential deposition of two-dimensional platinum layers, facilitating the fabrication of films with desired thicknesses relevant to a range of advanced technologies, including catalysis, magnetics, and electronics.
Career Highlights
Yihua Liu is currently employed by the Government of the United States of America, as represented by the Secretary of Commerce. His work focuses on advancing the understanding and application of electrochemical processes in various fields.
Collaborations
Yihua Liu collaborates with Thomas P Moffat, contributing to the development of innovative technologies in electrochemical deposition.
Conclusion
Yihua Liu's contributions to the field of electrochemical deposition highlight his innovative spirit and dedication to advancing technology. His patent on the self-terminating growth of platinum showcases the potential for significant advancements in various applications.
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