Yicheng MA

Title: Yicheng MA and Real-Time Chemical Vapor Deposition Characterization

Introduction

Yicheng MA is an inventor based in Hangzhou, China, and is associated with Zhejiang University. His patent work focuses on improving the monitoring and optimization of chemical vapor deposition (CVD), a process used to deposit materials under controlled conditions. He is credited with 1 patent.

Latest Patents

MA’s patent, “Absorption spectrum-based chemical vapor deposition online in-situ characterization system and method,” describes a system combining an absorption spectrum detection device, a spectrum movement and optical path calibration device, and a tubular CVD device.

The invention is designed to support accurate, real-time detection during CVD under high-temperature and low-pressure conditions. Environmental compensation helps account for changes in temperature and pressure, allowing researchers to track how a sample or reaction system changes over time and identify suitable deposition conditions. Automatic optical-path calibration also enables measurements at different positions within the quartz tube, helping determine the sample’s growth window.

Career Highlights

The patent highlights MA’s work on in-situ characterization and process monitoring for material deposition. By connecting spectral measurements with environmental conditions, the system aims to provide information that can help researchers assess deposition behavior and refine process parameters.

Collaborations

MA is associated with Zhejiang University. His listed coworkers include Rong Xiang and Lingfeng Wang.

Conclusion

Yicheng MA’s patented CVD characterization system brings together absorption spectroscopy, environmental compensation, and optical-path calibration to support real-time process analysis and the identification of suitable deposition conditions.