Yi-Yung Chen

Title: Innovations of Yi-Yung Chen in Surface Modification Technology.

Introduction

Yi-Yung Chen is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of surface modification technology, particularly in enhancing the conductivity of non-conductive substrates. His innovative approaches have implications for various industrial applications.

Latest Patents

Yi-Yung Chen holds a patent for a method that modifies the surface of non-conductive substrates and the sidewalls of micro/nano holes using reduced graphene oxide (rGO). This method allows for the chemical modification of these substrates, enabling them to become conductive and suitable for direct electroplating. The rGO-grafted holes demonstrate reliability under thermal shock tests after electroplating. The advantages of this grafting process include a short processing time, the absence of complex and toxic agents, and its environmentally friendly nature, as it utilizes an aqueous solution instead of organic solvents.

Career Highlights

Throughout his career, Yi-Yung Chen has been associated with prominent institutions such as National Chung Hsing University and Triallian Corporation. His work has focused on advancing technologies that improve the functionality and reliability of electronic components.

Collaborations

Yi-Yung Chen has collaborated with notable colleagues, including Wei-Ping Dow and Wei-Yang Zeng. Their joint efforts have contributed to the development of innovative solutions in the field of surface modification.

Conclusion

Yi-Yung Chen's contributions to surface modification technology highlight his role as an influential inventor. His patented methods and collaborative efforts continue to impact the industry positively.