This inventor holds 1 USPTO granted patent. Top assignee: Powerchip Semiconductor Manufacturing Corporation. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Yi-Yeh Chuang: Innovator in Semiconductor Manufacturing
Introduction
Yi-Yeh Chuang is a prominent inventor based in Changhua, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to double patterning methods.
Latest Patents
Yi-Yeh Chuang holds a patent for a "Double patterning method of manufacturing select gates and word lines." This invention involves a detailed process that includes forming first string patterns composed of word line patterns and select gate patterns on a target layer. The method further includes forming a conformal spacer layer on the first string patterns, creating trenches between them, and filling these trenches with a fill layer. The process culminates in the formation of target patterns that are spaced apart, which are then used as a mask for etching processes to create word lines and select gates.
Career Highlights
Chuang is currently employed at Powerchip Semiconductor Manufacturing Corporation, where he continues to advance his work in semiconductor technologies. His expertise in manufacturing processes has positioned him as a valuable asset in the industry.
Collaborations
He has collaborated with notable colleagues, including Zih-Song Wang and Li-Ta Chen, contributing to various projects within the semiconductor field.
Conclusion
Yi-Yeh Chuang's innovative work in semiconductor manufacturing, particularly his patented double patterning method, showcases his significant impact on the industry. His contributions continue to influence advancements in technology and manufacturing processes.