Yi-Wei Lin

Title: Yi-Wei Lin: Innovator in Electrode Technology and Printing Methods

Introduction

Yi-Wei Lin is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the fields of electrode technology and printing methods. With a total of 3 patents to his name, Lin continues to push the boundaries of innovation in his field.

Latest Patents

Yi-Wei Lin's latest patents include an array-type electrode and a gravure offset printing apparatus. The array-type electrode features a substrate, an isolating layer, an electrode, and a micro-structure layer. The isolating layer is positioned on one side of the substrate, while the electrode is divided into three parts, with connections made through the substrate. The micro-structure layer is placed on the isolating layer, enhancing the electrode's functionality. The gravure offset printing apparatus consists of two clamps, a printing roller, and a driving device. This apparatus is designed to facilitate the printing process by allowing the blanket to undergo reverse motions, which in turn rotates the printing roller and applies offset ink effectively.

Career Highlights

Yi-Wei Lin is associated with the Industrial Technology Research Institute, where he has been instrumental in developing innovative technologies. His work has garnered attention for its practical applications and advancements in manufacturing processes.

Collaborations

Lin collaborates with talented individuals such as Yu-Ming Wang and Yu-Tai Li, contributing to a dynamic research environment that fosters innovation.

Conclusion

Yi-Wei Lin's contributions to technology through his patents and collaborative efforts highlight his role as a key innovator in his field. His work continues to inspire advancements in electrode technology and printing methods.