Taipei, Taiwan

Yi-Wei Lee

USPTO Granted Patents = 40 

Average Co-Inventor Count = 2.8

ph-index = 5

Forward Citations = 104(Granted Patents)


Location History:

  • Tao Yuan Shien, TW (2010 - 2011)
  • Taoyuan County, TW (2011)
  • Taoyuan, TW (2009 - 2021)
  • Hsinchu, TW (2008 - 2023)
  • Taipei, TW (2015 - 2023)

Company Filing History:


Years Active: 2008-2024

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40 patents (USPTO):

Title: Innovator of Photolithography: Yi-Wei Lee

Introduction: Yi-Wei Lee, a notable inventor based in Taipei, Taiwan, holds an impressive portfolio of 40 patents. His groundbreaking work in the field of photolithography has advanced the technology significantly and contributed to the ongoing evolution of semiconductor manufacturing processes.

Latest Patents: Among Yi-Wei Lee's latest innovations is a patent focused on methods and systems for reducing particulate deposition on photomasks. This invention specifically addresses the particulate deposition rate on photolithographic masks, particularly concerning tin (Sn) particles produced within an Extreme Ultraviolet (EUV) light source. The innovation entails creating turbulence within the radiation source chamber of the EUV light source by altering temperature, pressure, and gas flow rates. This turbulence effectively mitigates the number of particles that can exit the EUV light source, reducing the likelihood of deposition on photomasks and enhancing the precision of semiconductor manufacturing.

Career Highlights: Yi-Wei Lee has demonstrated remarkable expertise throughout his career, with significant contributions to both Richtek Technology Corporation and AU Optronics Corporation. His role in these companies has been instrumental in driving innovation and implementing advanced technologies in the production processes.

Collaborations: Throughout his career, Yi-Wei Lee has collaborated with esteemed professionals such as Isaac Y. Chen and Ching-Yun Chu. These collaborations have enriched his work with diverse perspectives and expertise, further enhancing the quality and impact of his inventions.

Conclusion: Yi-Wei Lee continues to be a pivotal figure in the realm of photolithography and semiconductor technology. His extensive patent portfolio reflects not only his innovative spirit but also his commitment to precision and excellence in the industry. As technology evolves, Yi-Wei Lee's contributions will undoubtedly play a crucial role in shaping the future of semiconductor manufacturing.

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