Taipei, Taiwan

Yi-Sheng Su

This inventor holds 1 USPTO granted patent. Top assignee: National Taiwan University. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yi-Sheng Su. Retrieved from https://idiyas.com/inventor/yi-sheng-su

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Yi-Sheng Su: Innovator in Patterning Process Compensation

Introduction

Yi-Sheng Su is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of patterning processes, particularly through his innovative methods that enhance correction accuracy while optimizing resource usage.

Latest Patents

Yi-Sheng Su holds a patent titled "Method for compensating effect of patterning process and apparatus thereof." This patent describes a method that compensates for the effects of a patterning process by adjusting correction amounts for all segments based on comparison values at evaluation points. Compared to traditional delta-chrome optical proximity correction methods, his approach reduces run time and maintains memory efficiency without compromising correction accuracy. He has 1 patent to his name.

Career Highlights

Yi-Sheng Su is affiliated with National Taiwan University, where he continues to advance research and development in his field. His work has garnered attention for its practical applications and innovative solutions.

Collaborations

Some of his notable coworkers include Kuen-Yu Tsai and Chooi-Wan Ng, who contribute to the collaborative efforts in research and development at National Taiwan University.

Conclusion

Yi-Sheng Su's contributions to the field of patterning processes exemplify the impact of innovative thinking in technology. His methods not only improve efficiency but also set a benchmark for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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