The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Jul. 06, 2012
Kuen-yu Tsai, Taipei, TW;
Chooi-wan NG, Taipei, TW;
Yi-sheng Su, Taipei, TW;
National Taiwan University, Taipei, TW;
Abstract
A method for compensating an effect of a patterning process is illustrated. The main concept of the method for compensating the effect of the patterning process is to add or subtract the correction amounts for all segments according to the set of the comparison values at the set of the evaluation points. Compared with the delta-chrome optical proximity correction method, the run time of the method for compensating the effect of the patterning process is reduced, the memory usage of the method for compensating the effect of the patterning process not increased, and the correction accuracy of the method for compensating the effect of the patterning process is not reduced.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile