This inventor holds 1 USPTO granted patent. Top assignee: National Taiwan University. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Chooi-Wan Ng: Innovator in Patterning Process Compensation
Introduction
Chooi-Wan Ng is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of patterning processes, particularly through his innovative methods that enhance efficiency and accuracy.
Latest Patents
Ng holds a patent titled "Method for compensating effect of patterning process and apparatus thereof." This patent describes a method for compensating the effects of a patterning process by adding or subtracting correction amounts for all segments based on comparison values at evaluation points. Compared to the delta-chrome optical proximity correction method, Ng's approach reduces runtime without increasing memory usage or compromising correction accuracy. He has 1 patent to his name.
Career Highlights
Ng is affiliated with National Taiwan University, where he continues to advance research and development in his field. His work has garnered attention for its practical applications in improving patterning processes.
Collaborations
Ng collaborates with esteemed colleagues such as Kuen-Yu Tsai and Yi-Sheng Su, contributing to a dynamic research environment that fosters innovation.
Conclusion
Chooi-Wan Ng's contributions to the field of patterning processes exemplify the impact of innovative thinking in technology. His work not only enhances efficiency but also sets a benchmark for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile